ECE 5037
Transcript Abbreviation:
Sld St Micro Lab
Course Description:
Introduction to Introduction to laboratory techniques for semiconductor device fabrication including photolithography, oxidation, diffusion, chemical processes, reactive ion etching, and metallization; fabrication and measurements of visible light emitting diodes (LED) and GaN High Electron Mobility Transistor (HEMT).
Course Levels:
Undergraduate (1000-5000 level)
Graduate (5000-8000 level)
Designation:
Elective
General Education Course:
(N/A)
Cross-Listings:
(N/A)
Credit Hours (Minimum if “Range”selected):
4.00
Max Credit Hours:
(N/A)
Select if Repeatable:
Off
Maximum Repeatable Credits:
(N/A)
Total Completions Allowed:
(N/A)
Allow Multiple Enrollments in Term:
No
Course Length:
14 weeks (autumn or spring)
12 weeks (summer only)
Off Campus:
Never
Campus Location:
Columbus
Instruction Modes:
In Person (75-100% campus; 0-24% online)
Prerequisites and Co-requisites:
Prereq or concur: 3030, and acceptance in ECE, MSE or EngPhysics major; or Grad standing in Engineering, Biological Sciences, or Math and Physical Sciences.
Electronically Enforced:
No
Exclusions:
(N/A)
Course Goals / Objectives:
Be competent with the basic techniques for fabrication of LEDs and GaN HEMTs
Be competent in applying knowledge learned in prerequisite semiconductor devices courses to fabrication of LEDs and GaN transistors, other semiconductor devices, and test structures
Be competent in performing current-voltage characterization of semiconductor devices and test structures fabricated in lab
Be competent in performing optical characterization of semiconductor devices and test structures fabricated in lab
Be competent in extraction of device parameters from and analysis and interpretation of test results
Be familiar with cleanroom procedures, and with safe use of the hazardous materials and equipment used in semiconductor device fabrication
Check if concurrence sought:
No
Contact Hours:
| Topic | LEC | REC out-of-class | REC in-class | Weekly LAB out-of-class | Weekly LAB in-class |
|---|---|---|---|---|---|
| Lab safety, overview of class | 1.0 | 0.0 | 0 | 0.0 | 0 |
| Theory of LEDs and process overview | 3.0 | 0.0 | 0 | 0.0 | 0 |
| Epitaxial Growth | 2.0 | 0.0 | 0 | 0.0 | 0 |
| Theory of XRD and PL Characterization | 2.0 | 0.0 | 0 | 0.0 | 0 |
| LED L-I optical characterization | 2.0 | 0.0 | 0 | 0.0 | 0 |
| Wafer Cleaning | 1.0 | 0.0 | 0 | 0.0 | 0 |
| Photolithography; photomask alignment, tolerances and layout | 2.0 | 0.0 | 0 | 0.0 | 0 |
| Reactive ion etching | 2.0 | 0.0 | 0 | 0.0 | 0 |
| Metal contact deposition - evaporation and sputter deposition | 2.0 | 0.0 | 0 | 0.0 | 0 |
| Sheet resistance, four-point probe | 1.0 | 0.0 | 0 | 0.0 | 0 |
| Rapid Thermal Anneal | 1.0 | 0.0 | 0 | 0.0 | 0 |
| Overview of GaN HEMT Theory and Process | 3.0 | 0.0 | 0 | 0.0 | 0 |
| Gate dielectrics and passivation | 2.0 | 0.0 | 0 | 0.0 | 0 |
| Ion implantation | 2.0 | 0.0 | 0 | 0.0 | 0 |
| Electrical testing of I-V characteristics | 1.0 | 0.0 | 0 | 0.0 | 0 |
| Introduction to working in a cleanroom, initial silicon wafer characterization, wafer cleaning | 0.0 | 0.0 | 0 | 4.0 | 0 |
| LED Processing and characterization | 0.0 | 0.0 | 0 | 19.0 | 0 |
| GaN HEMT processing and characterization | 0.0 | 0.0 | 0 | 19.0 | 0 |
| Total | 27 | 0 | 0 | 42 | 0 |
Grading Plan:
Letter Grade
Course Components:
Lecture
Lab
Grade Roster Component:
Lab
Credit by Exam (EM):
No
Grades Breakdown:
| Aspect | Percent |
|---|---|
| Homework | 25% |
| Device Testing Lab Report | 40% |
| Lab Rules and Participation 10% | 10% |
| Pre-lab Assignments | 10% |
| Post-Lab Assignments | 10% |
| Process Simulation Assignments | 5% |
Representative Textbooks and Other Course Materials:
| Title | Author | Year |
|---|---|---|
| Light Emitting Diodes | E. Fred Schubert | |
| Gallium Nitride (GaN): Physics, Devices, and Technology (Devices, Circuits, and Systems) | Farid Medjdoub |
ABET-CAC Criterion 3 Outcomes:
(N/A)
ABET-ETAC Criterion 3 Outcomes:
(N/A)
ABET-EAC Criterion 3 Outcomes:
| Substantial contribution (3-6 hours) | 1 | an ability to identify, formulate, and solve complex engineering problems by applying principles of engineering, science, and mathematics |
| Some contribution (1-2 hours) | 2 | an ability to apply engineering design to produce solutions that meet specified needs with consideration of public health, safety, and welfare, as well as global, cultural, social, environmental, and economic factors |
| Substantial contribution (3-6 hours) | 3 | an ability to communicate effectively with a range of audiences - pre-2019 EAC SLO (g) |
| Some contribution (1-2 hours) | 4 | an ability to recognize ethical and professional responsibilities in engineering situations and make informed judgments, which must consider the impact of engineering solutions in global, economic, environmental, and societal contexts |
| Some contribution (1-2 hours) | 5 | an ability to function effectively on a team whose members together provide leadership, create a collaborative and inclusive environment, establish goals, plan tasks, and meet objectives |
| Substantial contribution (3-6 hours) | 6 | an ability to develop and conduct appropriate experimentation, analyze and interpret data, and use engineering judgment to draw conclusions |
| Some contribution (1-2 hours) | 7 | an ability to acquire and apply new knowledge as needed, using appropriate learning strategies |
Embedded Literacies Info: