ECE 6532
Transcript Abbreviation:
Nanofab Nano Dev
Course Description:
Fundamentals of nanostructures and devices; engineering and physics of new devices, confined structures in low dimensions and their effects on traditional devices; nanofabrication and nanomanufacturing.
Course Levels:
Graduate
Designation:
Elective
General Education Course
(N/A)
Cross-Listings
(N/A)
Credit Hours (Minimum if “Range”selected):
3.00
Max Credit Hours:
3.00
Select if Repeatable:
Off
Maximum Repeatable Credits:
3.00
Total Completions Allowed
(N/A)
Allow Multiple Enrollments in Term:
No
Course Length:
14 weeks (autumn or spring)
12 weeks (summer only)
Off Campus:
Never
Campus Location:
Columbus
Instruction Modes:
In Person (75-100% campus; 0-24% online)
Prerequisites and Co-requisites:
Prereq: 6531, 5531, or 730, or Grad standing in Engineering, Biological Sciences, or Math and Physical Sciences.
Electronically Enforced:
No
Exclusions:
Not open to students with credit for 5532 (835.03).
Course Goals / Objectives:
Be able to appreciate and understand from a conceptual point of view semiconductor-based anostructures, devices and systems
Learn the fundamentals of nano-fabrication and manufacturing technologies
Be exposed to the instrumentation and equipment for nanoscale device processing and characterization
Develop basic understanding of integration of nanoscale devices and systems, and nanobiotechnologies
Check if concurrence sought:
No
Contact Hours:
| Topic | LEC | REC | LAB | LAB Inst |
|---|---|---|---|---|
| Nanoscale devices and nanobiotechnology | 2.0 | 0.0 | 0.0 | 0 |
| Fundamentals of reduced dimensional structures | 4.0 | 0.0 | 0.0 | 0 |
| Advanced nanoscale MOSFETs (FinFETs and double-gate MOSFETs) | 3.0 | 0.0 | 0.0 | 0 |
| Single electron transistors | 3.0 | 0.0 | 0.0 | 0 |
| Carbon-based nanomaterials and devices and nanowire FETs | 4.0 | 0.0 | 0.0 | 0 |
| Quantum-dot optoelectronic devices | 2.0 | 0.0 | 0.0 | 0 |
| Biosensors | 2.0 | 0.0 | 0.0 | 0 |
| Nano-Electro-Mechanical-Systems (NEMS) | 3.0 | 0.0 | 0.0 | 0 |
| X-ray lithography and LIGA | 2.0 | 0.0 | 0.0 | 0 |
| Bulk and surface micromachining techniques for the fabrication of master molds | 1.0 | 0.0 | 0.0 | 0 |
| Scanning probe microscopy | 1.0 | 0.0 | 0.0 | 0 |
| Nanoimprinting and dip-pen lithography | 2.0 | 0.0 | 0.0 | 0 |
| Near-field optical techniques for nanoscale fabrication and characterization | 2.0 | 0.0 | 0.0 | 0 |
| Self-assembly and self-organization | 5.0 | 0.0 | 0.0 | 0 |
| Polymer processing for biomedical device applications | 2.0 | 0.0 | 0.0 | 0 |
| Integration of nanoscale biomedical devices and systems | 2.0 | 0.0 | 0.0 | 0 |
| Total | 40 | 0 | 0 | 0 |
Grading Plan:
Letter Grade
Course Components:
Lecture
Grade Roster Component:
Lecture
Credit by Exam (EM):
No
Grades Breakdown:
| Aspect | Percent |
|---|---|
| Homework | 15% |
| Midterm review paper (nanodevices) | 35% |
| Final review paper (nanotechnology) | 35% |
| In-class presentation | 15% |
Representative Textbooks and Other Course Materials:
| Title | Author | Year |
|---|---|---|
| Introduction to Nanoscale Science and Engineering | M. Di Ventra, S. Evoy, J.R. Heflin Jr. |
ABET-CAC Criterion 3 Outcomes
(N/A)
ABET-ETAC Criterion 3 Outcomes
(N/A)
ABET-EAC Criterion 3 Outcomes
(N/A)
Embedded Literacies Info
(N/A)
Attachments
(N/A)
Additional Notes or Comments
(N/A)